The Physics of Si: O2 and its Interfaces. Proceedings of the International Topical Conference on the Physics of Si: O2 and Its Interfaces Held at the IBM Thomas J. Waston Research Center, Yorktown Heights, New York, March 22–24, 1978
Sokrates T. Pantelides (Eds.)კატეგორია:
წელი:
1978
გამომცემლობა:
Pergamon Press
ენა:
english
გვერდები:
493
ISBN 10:
0080230490
ISBN 13:
9780080230498
ფაილი:
PDF, 13.97 MB
IPFS:
,
english, 1978